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Monolithic multiple axis accelerometer design in standard CMOS (1995)
| Venue: | in Standard CMOS,” Proc. SPIE 1995 Symposium on Micromachining and Microfabrication |
| Citations: | 4 - 3 self |
BibTeX
@INPROCEEDINGS{Warneke95monolithicmultiple,
author = {Brett Warneke and Eric Hoffman and Kristofer S.J. Pister},
title = {Monolithic multiple axis accelerometer design in standard CMOS},
booktitle = {in Standard CMOS,” Proc. SPIE 1995 Symposium on Micromachining and Microfabrication},
year = {1995},
pages = {95--102}
}
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Abstract
Using a single maskless postprocessing step we have developed an accelerometer in a standard commercial CMOS process capable of a sensitive axis parallel or perpendicular to the die surface. Our postprocess is realized using xenon difluoride (XeF 2 ) as a bulk etchant. The combination of this etchant and the standard CMOS process allows realization of cantilevers with piezoresistive sensors in all spacial coordinates from a widely-accessible source and at a minimal cost. Fabrication of accelerometers for all three axes and associated electronics on a single piece of silicon reduces the cost of three-dimensional acceleration detection while increasing sensor reliability. Keywords: accelerometers, micromachined sensors, CMOS sensors, XeF 2 etchant, piezoresistive sensors, aluminum hinges, 3D microstructures 1.
Keyphrases
standard cmos monolithic multiple axis accelerometer design piezoresistive sensor minimal cost spacial coordinate bulk etchant die surface sensitive axis parallel single piece xenon difluoride single maskless sensor reliability standard commercial cmos process capable aluminum hinge standard cmos process three-dimensional acceleration detection cmos sensor widely-accessible source
