DMCA
Inspection-analysis Solution for High-quality and High-efficiency Device Manufacturing
BibTeX
@MISC{Nozoe_inspection-analysissolution,
author = {Mari Nozoe and Hiroyuki Shinada and Taku Ninomiya and Seiji Isogai and Yoji Ichiyasu},
title = {Inspection-analysis Solution for High-quality and High-efficiency Device Manufacturing},
year = {}
}
Share
 |
 |
 |
 |
||
OpenURL
Abstract
OVERVIEW: The mass-production of a 90-nm node device and the development of a 65-nm node device were started in earnest in 2004. The manufacturing technology will be needed during the development of advanced devices to control and optimize the process condition and parameters by using the electrical characteristics during the development of advanced devices. Hitachi Group proposes inspection and analysis solution, ones that focus on in-line electrical characteristics monitoring. This solution consists of advanced inspection and analysis tools and application technology.
Keyphrases
inspection-analysis solution high-efficiency device manufacturing advanced device 65-nm node device 90-nm node device process condition analysis solution advanced inspection electrical characteristic in-line electrical characteristic monitoring application technology analysis tool hitachi group
