Results 1 - 10 of 18

An xband to Ku-band RF MEMS switched coplanar strip filter

by Christopher D. Nordquist, Arnoldo Muyshondt, Michael V. Pack, Patrick S. Finnegan, Christopher W. Dyck, Isak C. Reines, Garth M. Kraus, Thomas A. Plut, George R. Sloan, Charles L. Goldsmith, Senior Member, Charles T. Sullivan, Senior Member - IEEE Microw. Wireless Compon. Lett , 2004
"... Abstract—Radio frequency microelectromechanical systems (RF MEMS) are key enabling technologies for miniature reconfig-urable circuits such as microwave filters. We present a two-pole monolithic RF MEMS switched filter, fabricated on GaAs, that employs surface-micromachined capacitors to present a v ..."
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Abstract—Radio frequency microelectromechanical systems (RF MEMS) are key enabling technologies for miniature reconfig-urable circuits such as microwave filters. We present a two-pole monolithic RF MEMS switched filter, fabricated on GaAs, that employs surface-micromachined capacitors to present a

A multi-metal surface micromachining process for tunable RFMEMS passives

by Yonghyun Shim, Student Member, Zhengzheng Wu, Student Member, Mina Rais-zadeh - J. Microelectromech. Syst , 2012
"... Abstract—This paper reports on a microfabrication technology for implementing high-performance passive components suitable for advanced RF front-ends. This technology offers three metal layers with different thicknesses, one dielectric, and two sacrificial layers, enabling the fabrication of continu ..."
Abstract - Cited by 2 (2 self) - Add to MetaCart
-0331] Index Terms—High quality factor, RF MEMS, surface micro-machining, tunable passives, ultra high frequency. I.

Universal MEMS Platforms for Passive RF Components: Suspended Inductors and Variable Capacitor," MEMS'98

by L. Fan, R. T. Chen, A. Nespola, M. C. Wu , 1998
"... We propose a universal MEMS technology platform for fabricating integrable passive components for radio frequency (RF) integrated circuits. This platform is based on a novel surface-micromachined Micro-Elevator by Self-Assembly (MESA) techque. Both high-Q inductors and variable capacitors can be rea ..."
Abstract - Cited by 2 (0 self) - Add to MetaCart
We propose a universal MEMS technology platform for fabricating integrable passive components for radio frequency (RF) integrated circuits. This platform is based on a novel surface-micromachined Micro-Elevator by Self-Assembly (MESA) techque. Both high-Q inductors and variable capacitors can

MEMS TUNABLE CAPACITORS WITH FRAGMENTED ELECTRODES AND

by A. Mehdaoui, M. B. Pisani, D. Tsamados, F. Casset, P. Ancey, A. M. Ionescu
"... This paper reports on the design, simulation and fabrication of tunable MEMS capacitors with fragmented metal (AlSi 4%) electrodes. We examine a rotational electro-thermal actuation. An analytic model of the rotational effect thermal actuator was established in order to show the periodicity of the c ..."
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of the capacitance when the angle increases. Evaluation of the impact of fringing fields on the capacitance has been carried out using finite element analysis (FEA). The MEMS capacitors were fabricated using metal surface micromachining with polyimide sacrificial layer. The maximum rotation, corresponding to a

Two novel structures for tunable MEMS capacitor with RF applications

by E. Abbaspour-sani, N. Nasirzadeh, G. Dadashzadeh - Progress In Electromagnetics Research, PIER68
"... Abstract—Two novel structures for high-Q MEMS tumble capacitors are presented.The proposed designs include full plate as well as the comb structured capacitors.They can be fabricated employing surface micromachining technology which is CMOS-compatible.The structures do not require the cantilever bea ..."
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Abstract—Two novel structures for high-Q MEMS tumble capacitors are presented.The proposed designs include full plate as well as the comb structured capacitors.They can be fabricated employing surface micromachining technology which is CMOS-compatible.The structures do not require the cantilever

A MEMS Tunable Capacitor Based on Plastically Deformed Vertical Comb Sets

by Jongbaeg Kim , Liwei Lin , Berkeley Sensor , Actuator Center - Proceedings of 2004 ASME International Mechanical Engineering Congress and Exposition
"... ABSTRACT We report microfabricated tunable capacitors based on plastically deformed vertical comb sets using a batch process. The arrangement of cascaded comb finger sets and the uniqueness of the angular vertical comb actuators enable large tuning ratio with a small angular displacement. The capac ..."
Abstract - Cited by 2 (0 self) - Add to MetaCart
generators and voltage-controlled oscillators. Previously, tunable MEMS capacitors have been demonstrated using parallel-plate approach by using the surface micromachining process with limited tuning performance due to the inherit pull-in phenomenon

Dynamics Of Polysilicon Parallel-Plate Electrostatic Actuators

by Patrick B. Chu, Phyllis R. Nelson, Mark L. Tachiki, Kristofer S. J. Pister , 1996
"... this paper uses a similar commercial surface micromachining process [3] to create large parallel plates to form a capacitor. Since the fabrication process puts a minimum constraint on the area of the plates and the length and width of the support beams, the actuator can be designed to operate over a ..."
Abstract - Cited by 18 (3 self) - Add to MetaCart
this paper uses a similar commercial surface micromachining process [3] to create large parallel plates to form a capacitor. Since the fabrication process puts a minimum constraint on the area of the plates and the length and width of the support beams, the actuator can be designed to operate over

High aspect-ratio polysilicon micromachining technology. Sensors Actuators A 2000;87:46–51

by Farrokh Ayazi, Khalil Najafi
"... This paper presents a single wafer, high aspect-ratio multi-layer polysilicon micromachining technology that combines deep dry etching of silicon with conventional surface micromachining to realize 10-100's of micron thick, high aspect-ratio, electrically isolated polysilicon structures with su ..."
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This paper presents a single wafer, high aspect-ratio multi-layer polysilicon micromachining technology that combines deep dry etching of silicon with conventional surface micromachining to realize 10-100's of micron thick, high aspect-ratio, electrically isolated polysilicon structures

Design and Development of an Integrated MEMS Sensor for Real Time

by Bryan G Morris, Gary S. May - Control of Plasma Etching, in Proc. NSTI Nanotech. Conf
"... This paper explores a novel technique for monitoring film thickness in reactive ion etching that incorporates a micromachined sensor. The prototype sensor correlates film thickness with the change in resonant frequency that occurs in the micromachined platform during etching. The prototype sensor co ..."
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to be inferred. The micromachined sensor is simulated using ANSYS 7.0. Simulation shows a direct correlation between platform film thickness and resonant frequency, as well as between the platform thickness and its capacitance. Modeling the sensor as a variable capacitor in an auto-zeroing floating gate

An in-plane high-sensitivity, lownoise micro-g silicon accelerometer

by Junseok Chae, Haluk Kulah, Khalil Najafi - in Proc. 16th IEEE International Conference on Micro Electro Mechanical Systems (MEMS’03 , 2003
"... itive silicon microaccelerometer utilizing a combined surface and bulk micromachining technology is reported. The accelerometer utilizes a 0.5-mm-thick, 2.4 1.0 mm2 proof-mass and high as-pect-ratio vertical polysilicon sensing electrodes fabricated using a trench refill process. The electrodes are ..."
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itive silicon microaccelerometer utilizing a combined surface and bulk micromachining technology is reported. The accelerometer utilizes a 0.5-mm-thick, 2.4 1.0 mm2 proof-mass and high as-pect-ratio vertical polysilicon sensing electrodes fabricated using a trench refill process. The electrodes
Results 1 - 10 of 18