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Abstract: Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining throughput comparable to today's optical lithography systems. This places stringent data-handling requirements on the design of any maskless lithography system. Today's optical lithography systems transfer one layer of data from the mask to the entire wafer in about sixty seconds. To achieve a similar throughput for a direct-write maskless lithography system with a pixel size of 25 nm, data... (Update)
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BibTeX entry: (Update)
V. Dai, A. Zakhor. "Lossless Layout Compression for Maskless Lithography Systems", Proceedings of the SPIE Emerging Lithographic Technologies IV, vol. 3997, March 2000. http://citeseer.ist.psu.edu/dai00lossless.html More
@misc{ dai00lossless,
author = "V. Dai and A. Zakhor",
title = "Lossless Layout Compression for Maskless Lithography Systems",
text = "V. Dai, A. Zakhor. Lossless Layout Compression for Maskless Lithography
Systems, Proceedings of the SPIE Emerging Lithographic Technologies IV,
vol. 3997, March 2000.",
year = "2000",
url = "citeseer.ist.psu.edu/dai00lossless.html" }
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