Proceedings of the 1999 Winter Simulation Conference P. A. Farrington, H. B....  Home/Search
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Abstract: We review progress on a project to evaluate prospective operations in a semiconductor wafer fab that employs nextgeneration, proximity X-ray lithography to pattern the critical dimensions of computer chips. A simulation model is developed that captures the processing of wafers through an X-ray lithography cell using a synchrotron as the source of exposure radiation. The model incorporates the best current information on unit-cell design and processing times and implements a range of events that ... (Update)
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BibTeX entry: (Update)
@inproceedings{ white99operational,
author = "K. Preston White and Walter J. Trybula",
title = "Operational simulation of an x-ray lithography cell: comparison of 200mm and 300mm wafers",
booktitle = "Winter Simulation Conference",
pages = "865-874",
year = "1999",
url = "citeseer.ist.psu.edu/405565.html" }
Citations (may not include all citations):2 Microchip Fabrication (context) - Van Zant - 1997
1 Performance of the IBM synchrotron Xray source for lithograp.. (context) - Archie - 1993
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1 The future costs of semiconductor lithography (context) - Hill - 1989
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1 ray lithography II--a progress report (context) - for, lithography et al. - 1992
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