Mason Lanse Freed  Home/Search
Context
Related
| berkeley.edu/papers/mfreed_4.pdf Cached: PDF This document uses CoBlitz to cache paper downloads. If your firewall is blocking outgoing connections to port 3125, you can use these links to download local copies.
PS.gz PS Image Update HelpFrom: berkeley.edu/papers/ (more) (Enter author homepages) |
Rate this article:      (best)Comment on this article |
Abstract: This dissertation is concerned with the development of novel wireless sensor technologies appropriate for semiconductor manufacturing applications. More specifically, the feasibility of placing sensors directly onto the surface of a standard silicon wafer is explored. Such a wafer-mounted sensor system would be fully integrated. It would include driver electronics, a power supply, and a communication system, in addition to the sensing elements. As a result, measurements can be made in-situ to... (Update)
Active bibliography (related documents): More All
1.0: Low-Open Area Endpoint Detection using a PCA based .. - White, Goodlin.. (2000) (Correct)
0.9: Autonomous On-Wafer Sensors for Process Modeling.. - Freed, Krüger.. (2001) (Correct)
0.7: Randomness And Dependence In Etch Process And Their.. - Resnick.. (Correct)
Similar documents based on text: More All
0.3: Hidden Markov Models for Endpoint Detection in Plasma Etch.. - Ge, Smyth (2001) (Correct)
0.2: Kalman Filtering with Intermittent Observations - Sinopoli, Schenato.. (2004) (Correct)
0.1: Software Architecture,the Architecting Process, and Examples of.. - Gacek (1994) (Correct)
BibTeX entry: (Update)
@phdthesisc{ freed01wafermounted,
author = "Mason Lanse Freed",
title = "Wafer-Mounted Sensor Arrays for Plasma Etch Processes",
url = "citeseer.ist.psu.edu/freed01wafermounted.html" }
Citations (may not include all citations):170 National Technology Roadmap for Semiconductors (context) - Association - 1997
63 Analysis and Design of Analog Integrated Circuits (context) - Gray, Meyer - 1993
26 Fundamentals of Heat and Mass Transfer (context) - Incropera, DeWitt - 1996
26 Fundamentals of Heat and Mass Transfer (context) - Incropera, DeWitt - 1996
9 Micromachined Transducers Sourcebook (context) - Kovacs - 1998
9 Micromachined Transducers Sourcebook (context) - Kovacs - 1998
5 Principles of Plasma Discharges and Materials Processing (context) - Lieberman, Lichtenberg - 1994
5 Technology Roadmap for Semiconductors (context) - Association - 1999
5 Advanced Mechanics of Materials (context) - Boresi, Sidebottom et al. - 1978
5 A deformable grating optical modulator (context) - Solgaard, Sandejas et al. - 1992
5 Principles of Plasma Discharges and Materials Processing (context) - Lieberman, Lichtenberg - 1994
5 Principles of Plasma Discharges and Materials Processing (context) - Lieberman, Lichtenberg - 1994
4 Automated malfunction diagnosis of semiconductor fabrication.. (context) - May, Spanos - 1993
4 Semiconductor Material and Device Characterization (context) - Schroder - 1990
3 Autonomous 129 micro-sensor arrays for process control of se.. (context) - Fisher, Freed et al. - 1999
3 Microsystem Design (context) - Senturia - 2000
2 A generalized model of heat e#ects in surface reactions (context) - Martz, Hess et al. - 1992
2 A generalized model of heat e#ects in surface reactions (context) - Martz, Hess et al. - 1992
2 A novel in-situ monitoring technique for reactive ion etchin.. (context) - Baker, Williams et al. - 1998
2 Interferometric real-time measurement of uniformity for plas.. (context) - Dalton, Conner et al. - 1994
2 Spatial characterization of wafer state using principal comp.. (context) - White, Boning et al. - 1997
2 Monitoring and diagnosis of plasma etch processes (context) - Dolins, Srivastava et al. - 1988
1 Calorimetric measurements with a heat flux transducer of the.. (context) - Ellmer, Mientus - 1999
1 Probabilistic Modeling for Fault Classification of Plasma Eq.. (context) - Ison - 1999
1 Etching rate characterization of SiO 2 and si using ion ener.. (context) - Ding, Jenq et al. - 1993
1 ects of ion bombardment 133 and chemical reaction on wafer t.. (context) - Durandet, Joubert et al. - 1989
1 Temperature dependence of reactive ion etching of gaas with .. (context) - Pearton, Emerson et al. - 1989
1 Temperature dependence of silicon nitride etching by atomic .. (context) - Loewenstein - 1989
1 Tantalum etching in fluorocarbon /oxygen rf glow discharges (context) - Martz, Hess et al. - 1990
1 An instrument for the direct measurement of intense thremal .. (context) - Gardon - 1953
1 An instrument for the measurement of heat flux from a surfac.. (context) - Kraabel, Braughn et al. - 1980
1 Controlled pulse-etching with xenon diflouride (context) - Chu, rey et al. - 1997
1 Design and fabrication of micro heat flux sensor (context) - Chun, Oh et al. - 1999
1 ray photoelectron spectoscopy study of the al/sio 2 interfac.. (context) - Hecht, Vasquez et al. - 1985
1 Etch rates for micromachining and ic processing v (context) - Williams - 1996
1 Real time in-situ data acquisition using autonomous on-wafer.. - Freed, Kruger et al. - 2000
1 wafer sensors for process modeling (context) - Freed, Kruger et al. - 2001
1 Lithium batteries for powering sensor arrays (context) - Chong, Lim et al. - 2000
1 Prentice Hall Electronics and VLSI Series (context) - Plummer, Deal et al. - 2000
1 Using regression equations for model-based diagnosis in the .. (context) - Spanos, May - 1990
1 Thermoelectric microsensor for heat flux measurement (context) - Volklein, Kessler - 1998
1 Plasma diagnostics for semiconductor processing (context) - Anderson - 2000
1 The development of a new direct-heat-flux gauge for heat-tra.. (context) - Piccini, Guo et al. - 2000
1 plasma proces monitorcontrol system (context) - Pamela, Smith et al. - 1998
1 Heat flux measurement using fibre-bragg-grating fabry-perot .. (context) - MacPherson, Kilpatrick et al. - 1999
1 surface-attached heat flux sensors (context) - Langley, Barnes et al. - 1999
1 High-frequency response heat-flux gauge (context) - Epstein, Guenette et al. - 1986
1 A study of multi-layered thin film heat transfer gauge and a.. (context) - Hayashi, Sakurai et al. - 1983
1 Transfer function of thin-film heat flux sensor (context) - Bauer, Heywood - 1997
1 A new instrument for radiation heat flux measurement - analy.. (context) - Martins, Carvelho et al. - 1995
1 Measurements with a heat flux microsensor deposited on a tra.. (context) - Johnson, Diller - 1995
1 Infrared calorimeter for time-resolved plasma energy flux me.. (context) - Ingraham, Miller - 1983
1 Modeling of heat transport and wafer heating e#ects during p.. (context) - Tretheway, Aydil - 1996
1 Modeling of plasma etching reactors including wafer heating .. (context) - Aydil, Economou - 1993
1 Extending electrical measuremenbts to (context) - Troccolo, Mantalas et al. - 1991
1 ray mask membrane in a plasma environment (context) - Faudon, Thole et al. - 1995
1 McGraw-Hill Kogakusha (context) - Millman, Halkias et al. - 1972
1 situ etch rate extraction from interferometric signals (context) - Wong, Boning - 1995
1 Platinumpalladium thin film thermocouple temperature measure.. (context) - Kreider, Platinum et al. - 1998
1 Innovative integrated plasma tool for process and exhaust mo.. (context) - Chevalier, Maquin - 1999
1 fabricated by thin film technology and micromachining (context) - Volklein, Blumers et al. - 1999
1 Epoxy-protected thermopile as high sensitive heat flux senso.. (context) - Meyer, Schneeberger et al. - 1997
1 study of an integrated infrared sensor (context) - Korvink, Lenggenhager et al. - 1994
1 Cmos membrane infrared sensors and improved tmahw etchant (context) - Lenggenhager, Jaeggi et al. - 1994
1 Mems for smart structures (context) - Mehregany - 1995
1 High-frequency heat flux sensor calibration and modeling (context) - Holmberg, Diller - 1995
1 A new heat flux sensor: From microvolts to millivolts (context) - Meyer, Keller - 1996
1 An experimental study of a radially arranged thin-film heat-.. (context) - Cho, Fralick et al. - 1997
1 Microfabricated thin-film physical sensors for histile envir.. (context) - Lei, Will et al. - 1998
1 Thermal power at a substrate during zno:al thin film deposit.. (context) - Wendt, Ellmer et al. - 1997
1 Integrated MEMS Tuning Fork Oscillators for Sensor Applicati.. (context) - Roessig - 1998
1 and monitoring of semiconductor manufacturing processes (context) - Fisher, Freed et al. - 1999
1 Real-time determination of plasma etch-rate selectivity (context) - Sarfaty, Baum et al. - 1998
1 Experiments with back side gas cooling using an electrostati.. (context) - Meyer, Kirmse et al. - 1926
1 A method of measuring specific resistivity and hall e#ect of.. (context) - van der Pauw - 1958
1 Extraction of sheet resistance from four-terminal sheet resi.. (context) - Cresswell, Guillaume et al. - 1999
http://www.sensarray.com
http://www.nanometrics.com
http://www.omega.com
http://www.efunda.com/designstandards/sensors/methods/wheatstone
http://www.mathworks.com/
Documents on the same site (http://jagger.me.berkeley.edu/papers/): More
Real Time In-Situ Data Acquisition Using Autonomous.. - Freed, Krüger.. (2000) (Correct)
An LMI method to demonstrate simultaneous stability using .. - Jarvis-Wloszek, Packard (Correct)
Autonomous On-Wafer Sensors for Process Modeling.. - Freed, Krüger.. (2001) (Correct)
Online articles have much greater impact More about CiteSeer.IST Add search form to your site Submit documents Feedback
CiteSeer.IST - Copyright Penn State and NEC