J. A. Sethian and D. Adalsteinsson, "An overview of level set methods for etching, deposition, and lithography development," IEEE Trans. Semiconduct. Manufact., vol. 10, pp. 167--184, Jan. 1997. Home/Search Document Details and Download
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Shape-Based Optimization of a Plasma Etching Process - Berg, Zhou (Correct)
....general [13] The one used here is the template metric, discussed further below. This work uses level set methods to describe the feature evolution. Sethian and Adalsteinsson apply level set methods to the simulation of feature developmentin avariety of semiconductor manufacturing applications [17, 16], using numerical methods based on hyperbolic conservation laws [14] Numerous papers have appeared on real time control of plasma etching and deposition [6, 9,11,15,20] but relatively few address events at the wafer surface, focusing instead on the bulk properties of the plasma. Those that do ....
J. A. Sethian and D. Adalsteinsson, "An Overview of Level Set Methods for Etching, Deposition, and LithographyDevelopment," IEEE Trans. Semiconduct. Manufacturing 10:1, pp. 167--184, 1997.
On Parameter Estimation Using Level Sets - Berg (1998) (1 citation) (Correct)
....the following sections we introduce a completely coordinate free cost function that eliminates this arbitrary element. In a recent series of papers Sethian and Adalsteinsson apply level set methods to the simulation of feature development in a variety of semiconductor manufacturing applications [1, 15, 16]. Level set methods provide a flexible framework for surface evolution problems. The main alternatives to level set methods are string methods. Here the surface is defined 1 by points, which are advanced according to the surface velocity. Two problems may occur if corners appear in the surface. ....
J. A. Sethian and D. Adalsteinsson, "An Overview of Level Set Methods for Etching, Deposition, and Lithography Development," IEEE Trans. Semiconduct. Manufacturing 10:1, pp. 167--184, 1997.
On Parameter Estimation Using Level Sets - Berg, Holmström (1999) (1 citation) (Correct)
....In the following sections we introduce a completely coordinate free cost function that eliminates this arbitrary element. In a recent series of papers Sethian and Adalsteinsson apply level set methods to the simulation of feature development in a variety of semiconductor manufacturing applications [1, 17, 18]. Level set methods provide a flexible framework for surface evolution problems. String methods are the main alternatives to level set methods. Here the surface is defined by points, which are advanced according to the surface velocity. Two problems may occur if corners appear in the surface. ....
J. A. Sethian and D. Adalsteinsson, "An Overview of Level Set Methods for Etching, Deposition, and Lithography Development," IEEE Trans. Semiconduct. Manufacturing 10:1, pp. 167--184, 1997.
IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED .. - Kinetics With Topography (1999) (Correct)
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J. A. Sethian and D. Adalsteinsson, "An overview of level set methods for etching, deposition, and lithography development," IEEE Trans. Semiconduct. Manufact., vol. 10, pp. 167--184, Jan. 1997.
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