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P. Buck (Dupont Photomasks), personal communication, International Sematech Mask-EDA Workshop, July 2001.

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This paper is cited in the following contexts:
Evaluation of the New OASIS Format for Layout Fill.. - Chen, Kahng, Robins.. (2004)   (Correct)

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P. Buck (Dupont Photomasks), personal communication, International Sematech Mask-EDA Workshop, July 2001.


Area Fill Generation With Inherent Data Volume Reduction - Yu Chen Andrew (2003)   (Correct)

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P. Buck (Dupont Photomasks), personal communication, International Sematech Mask-EDA Workshop, July 2001.

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