J.C. Martz, D.W. Hess, and W.E. Anderson. Tantalum etching in fluorocarbon /oxygen rf glow discharges. J. Appl. Phys., 67(8):3609--3617, Apr 1990. Home/Search Document Not in Database Summary Related Articles |
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Wafer-Mounted Sensor Arrays for Plasma Etch Processes - Freed (2001) (Correct)
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J.C. Martz, D.W. Hess, and W.E. Anderson. Tantalum etching in fluorocarbon /oxygen rf glow discharges. J. Appl. Phys., 67(8):3609--3617, Apr 1990.
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