A. B. Kahng, S. Vaya and A. Zelikovsky, "New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout", Proc. Asia and South Pacific Design Automation Conf., Jan. 2001, pp. 133-138. Home/Search Document Details and Download
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Layout Design Methodologies for Sub-Wavelength Manufacturing - Michael Rieger Sw (2001) (1 citation) (Correct)
....Figure 4, do not allow alternating mapping of phases across every feature while providing phase areas meeting the required minimum size. To use PSM such cyclic conflicts must not be present in the design layout. Graph techniques may be used to optimally remove cyclic conflicts from layout designs [6]. The most likely modification is to increase the spacing between any one of the pairs of lines so that two properly sized phase regions can be placed between them. An alternative, if possible, is making one of the lines non critical, hence larger, so that it will safely image without the phase ....
A. B. Kahng, S. Vaya and A. Zelikovsky, "New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout", Proc. Asia and South Pacific Design Automation Conf., Jan. 2001, pp. 133-138.
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