R. Tian, X. Tang and D. F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process ", International Symposium on Physical Design, April 2001, pp. 118-123. Home/Search Document Not in Database Summary Related Articles Check |
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Closing the Smoothness and Uniformity Gap in Area Fill.. - Chen, Kahng, Robins (2002) (Correct)
....on the fixed dissection context, including: ffl Linear Programming (LP) methods based on rounding relaxation of the corresponding integer linear program formulations. The LP formulations for filling were first proposed by Kahng et al. in [6] and adapted to other objectives and CMP models in [12, 13]) ffl Greedy methods which iteratively find the best tile for the next filling geometry to be added into the layout. These methods were first used in [3] for ILD thickness control, and also used for shallow trench isolation (STI) CMP model in [13] ffl Monte Carlo (MC) methods, which are ....
....adapted to other objectives and CMP models in [12, 13] ffl Greedy methods which iteratively find the best tile for the next filling geometry to be added into the layout. These methods were first used in [3] for ILD thickness control, and also used for shallow trench isolation (STI) CMP model in [13]) ffl Monte Carlo (MC) methods, which are similar to greedy methods but insert the next filling geometry randomly. Due to its efficiency and accuracy, these were used for both flat [3, 4] and hierarchical [2] layout density control; and ffl Iterated Greedy (IGreedy) and Iterated Monte Carlo ....
R. Tian, X. Tang and D. F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process ", International Symposium on Physical Design, April 2001, pp. 118-123.
Evaluation of the New OASIS Format for Layout Fill.. - Chen, Kahng, Robins.. (2004) (Correct)
No context found.
R. Tian, X. Tang and D. F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process ", International Symposium on Physical Design, April 2001, pp. 118-123.
Area Fill Generation With Inherent Data Volume Reduction - Yu Chen Andrew (2003) (Correct)
No context found.
R. Tian, X. Tang and D. F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process ", Proc. ACM/IEEE International Symposium on Physical Design, April 2001, pp. 118-123.
Area Fill Synthesis for Uniform Layout Density - Chen, Kahng, Robins, Zelikovsky (2002) (Correct)
No context found.
R. Tian, X. Tang and D. F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process ", International Symposium on Physical Design, April 2001, pp. 118-123.
Monte-Carlo Methods For Chemical-Mechanical.. - Chen, Kahng, Robins, .. (2002) (Correct)
No context found.
R. Tian, X. Tang and D. F. Wong, "Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process ", International Symposium on Physical Design, Apr. 2001, pp. 118-123.
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