M. Gesley, "Mask patterning challenges for device fabrication below 100 nm", Microelectronic Engineering 41/42, pp. 7-14, 1998.

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Lossless Layout Compression for Maskless Lithography Systems - Dai, Zakhor (2000)   (3 citations)  (Correct)

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M. Gesley, "Mask patterning challenges for device fabrication below 100 nm", Microelectronic Engineering 41/42, pp. 7-14, 1998.

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